| 摘要 |
A plasma processing apparatus includes: a lift mechanism which, in a process vessel, moves down a stage to a standby position when plasma processing is not performed and moves up the stage to a processing position when the plasma processing is performed; a holding member detachably holding a mask which is to cover an outer peripheral edge portion of the substrate, between the standby position and the processing position; and a positioning mechanism positioning the mask on the stage, wherein: the mask is held while being horizontally movable without being positioned by the holding member; and when the stage is moved up from the standby position toward the processing position, the mask is transferred from the holding member onto the stage, and the mask is positioned on the stage by the positioning mechanism.
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