发明名称 WAFER MACHINING METHOD
摘要 Provided is a wafer processing method whereby a wafer having an insulating seal for reinforcement mounted on a rear surface can be divided efficiently into individual devices. The wafer processing method for dividing a wafer having devices formed in multiple regions on a front surface into individual device chips along scheduled division lines comprises: a rear surface grinding process of attaching a protective tape to the front surface of a wafer and grinding the rear surface of the wafer, thereby forming a predetermined thickness; an insulating seal-for-reinforcement mounting process of mounting an insulating seal for reinforcement, which transmits infrared rays, on the rear surface of the wafer while exfoliating the protective tape; and an insulating seal-for-reinforcement curing process of curing the insulating seal for reinforcement by heating the same. The wafer processing method also comprises: a modified layer forming process of forming a modified layer along the scheduled division lines inside the wafer by radiating a laser beam along the scheduled division lines; and a wafer dividing process of dividing the wafer having the insulating seal for reinforcement mounted on a rear surface into individual device chips along the scheduled division lines having the modified layer having formed therealong by applying an external force to the wafer.
申请公布号 KR20160069473(A) 申请公布日期 2016.06.16
申请号 KR20150171498 申请日期 2015.12.03
申请人 DISCO CORPORATION 发明人 YAMASHITA YOHEI;FURUTA KENJI;LEE YIHUI
分类号 H01L21/78;H01L21/268;H01L21/324;H01L21/683;H01L21/76 主分类号 H01L21/78
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