发明名称 |
METHOD FOR GENERATING PARAMETER PATTERN, ION IMPLANTATION METHOD AND FEED FORWARD SEMICONDUCTOR MANUFACTURING METHOD |
摘要 |
The present disclosure provides a method for generating a parameter pattern including: performing a plurality of measurements upon a plurality of regions on a surface of a workpiece to obtain a plurality of measured results; and deriving a parameter pattern according to the plurality of measured results by a computer; wherein the parameter pattern includes a plurality of regional parameter values corresponding to each of the plurality of regions on the surface of the workpiece. The present disclosure provides a Feed Forward semiconductor manufacturing method including: forming a layer with a desired pattern on a surface of a workpiece; deriving a control signal including a parameter pattern according to spatial dimension measurements against the layer with the desired pattern distributed over a plurality of regions of the surface of the workpiece; and performing an ion implantation on the surface of the workpiece according to the control signal. |
申请公布号 |
US2016254122(A1) |
申请公布日期 |
2016.09.01 |
申请号 |
US201514632719 |
申请日期 |
2015.02.26 |
申请人 |
Taiwan Semiconductor Manufacturing Company Ltd. |
发明人 |
WU CHENG-TA;WU TSUNG HAN;HSU YAO-WEN;TAN LUN-KUANG;YOU WEI-MING;WANG TING-CHUN |
分类号 |
H01J37/317 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
1. A method for generating a parameter pattern, comprising:
performing a plurality of measurements upon a plurality of regions on a surface of a workpiece to obtain a plurality of measured results; and deriving a parameter pattern according to the plurality of measured results by a computer; wherein the parameter pattern comprises a plurality of regional parameter values corresponding to each of the plurality of regions on the surface of the workpiece. |
地址 |
Hsinchu TW |