| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt for an acid generator affording a resist composition showing high resolution. <P>SOLUTION: The salt is represented by formula (I). In formula (I), Q<SP>1</SP>and Q<SP>2</SP>are each F or a perfluoroalkyl group; X<SP>1</SP>is a bivalent saturated hydrocarbon group, provided that -CH<SB>2</SB>- in the group is optionally substituted with -O- or -CO-; Y<SP>1</SP>is an aliphatic hydrocarbon group, alicyclic hydrocarbon group or aromatic hydrocarbon group, provided that -CH<SB>2</SB>- in the aliphatic hydrocarbon group or the alicyclic hydrocarbon group is optionally substituted with -O- or -CO-; R<SP>p1</SP>and R<SP>p2</SP>are each an alkyl group; R<SP>p3</SP>and R<SP>p4</SP>are each H or an alkyl group; X<SP>p1</SP>is -[CH<SB>2</SB>]<SB>p1</SB>-, provided that -CH<SB>2</SB>- in the group is optionally substituted with -O-, -CO-, bivalent alicyclic hydrocarbon group or bivalent aromatic hydrocarbon group, and that H in the group is optionally substituted with a hydroxy group or aliphatic hydrocarbon group; and p<SP>1</SP>is an integer of 1-8; and A is a polymerizable group. <P>COPYRIGHT: (C)2011,JPO&INPIT |
