发明名称 |
Method for attachment of an electrode into an inductively-coupled plasma |
摘要 |
An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible. |
申请公布号 |
US9530625(B2) |
申请公布日期 |
2016.12.27 |
申请号 |
US201514734905 |
申请日期 |
2015.06.09 |
申请人 |
FEI COMPANY |
发明人 |
Kellogg Sean;Graupera Anthony;Parker William N.;Wells Andrew B.;Utlaut Mark W.;Skoczylas Walter;Schwind Gregory A.;Smith Noel;Zhang Shouyin |
分类号 |
H01J37/32;H01J9/02;H01J37/04;H01J37/08;H01J27/16 |
主分类号 |
H01J37/32 |
代理机构 |
Scheinberg & Associates, P.C. |
代理人 |
Scheinberg & Associates, P.C. ;Scheinberg Michael O. |
主权项 |
1. A method for removable attachment of an electrode to a plasma source, comprising:
providing a plasma source having a reaction chamber, said reaction chamber having a multilayer metal interface layer on a portion of the reaction chamber to which a source electrode or a component to which the source electrode is attached is mounted; and removably attaching the source electrode to the plasma source, the interface layer providing a thermally conductive, vacuum sealable joint between the reaction chamber and the source electrode or a component to which the source electrode is attached. |
地址 |
Hillsboro OR US |