| 发明名称 |
POLISHING SYSTEM COMPRISING A HIGHLY BRANCHED POLYMER |
| 摘要 |
<p>The invention provides a polishing system and method of its use comprising (a) a liquid carrier, (b) a polymer having a degree of branching of 50% or greater, and (c) a polishing pad, an abrasive, or a combination thereof.</p> |
| 申请公布号 |
WO2005071031(A1) |
申请公布日期 |
2005.08.04 |
| 申请号 |
WO2005US00187 |
申请日期 |
2005.01.05 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
MOEGGENBORG, KEVIN;SUN, FRED |
| 分类号 |
C09G1/00;C09G1/02;(IPC1-7):C09G1/00 |
主分类号 |
C09G1/00 |
| 代理机构 |
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