| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve shape accuracy (uniformity of the width for removing an unnecessary film) at an end of a resist film after an unnecessary film is removed, to suppress deviation of film thickness and to prevent generation of residue of an unnecessary film after an unnecessary film is removed. <P>SOLUTION: A device for removing an unnecessary film is disclosed for removing a portion of an unnecessary film by supplying a chemical liquid. The device includes a substrate holding means, a chemical liquid supplying means to supply the chemical liquid, a shielding member that forms a given gap against the main surface of a mask blank in a removal region and forms a space larger than the gap in a non-removal region, a chemical liquid guide member to form a flow passage of the chemical liquid, and a movable holding means for a substrate. An unnecessary film in a removal region of the main surface of the mask blank is removed by rotating the substrate holding means in a fixed state while the rotation center of the shielding member and the liquid guide member is aligned to the rotation center of the substrate holding means, and supplying a chemical liquid to the flow passage and into the gap by the chemical liquid supply means. <P>COPYRIGHT: (C)2008,JPO&INPIT |
