| 摘要 |
PROBLEM TO BE SOLVED: To provide a polymer included in a composition for forming an immersion overlay film, which allows formation of an immersion overlay film that can exhibit good water repellency and developer solubility in a well-balanced manner and substantially prevents defects in a resist.SOLUTION: The polymer has a structural unit (I) including a group expressed by formula (i). In the formula, Rrepresents H, a halogen atom, nitro group, alkyl group, monovalent alicyclic hydrocarbon group, alkoxy group, acyl group, aralkyl group or aryl group; Rrepresents -C(=O)-R, -S(=O)-R, -R-CN or -R-NO; Rrepresents a fluorinated alkyl group; Rrepresents H, an alkyl group, fluorinated alkyl group, monovalent alicyclic hydrocarbon group, alkoxy group, aralkyl group or aryl group; and Rand Rrepresent a single bond, a methylene group, or an alkylene group having 2 to 5 carbon atoms. |
