LASER ANNEALING AND ELECTRIC FIELD

摘要

A method and apparatus for exposing a photoresist in the presence of an electric field using a high power continuous wave source as a radiation source is disclosed herein. In one embodiment, a processing region includes a stage, a translation mechanism, a continuous wave electromagnetic module, and plurality of electrode assemblies. The continuous wave electromagnetic module includes a continuous wave electromagnetic radiation source in the form of a high power continuous wave electromagnetic laser. An electric field is applied to the surface of the substrate using the plurality of electrode assemblies while the continuous wave electromagnetic radiation source selectively irradiates the surface of the substrate.

主权项

1. A processing chamber for processing a substrate, the processing chamber comprising:
a stage with a substrate support surface; a continuous wave electromagnetic module configured to heat a surface of the substrate, the continuous wave electromagnetic module comprising:
a continuous wave electromagnetic radiation source, wherein the continuous wave electromagnetic radiation source is a continuous wave electromagnetic laser; a translation mechanism configured to translate the stage or the continuous wave electromagnetic radiation source; and a plurality of electrode assemblies surrounding the stage to create an electric field about the surface of the substrate support surface.