发明名称 ION BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To achieve a mechanism for accurately adjusting an emission direction of ion from an emitter tip (21) to a direction of a sample by making compact an ion irradiation system, and shortening ion optical length.SOLUTION: A charged particle beam microscope is configured of: a gas field ionization ion source (1); a focusing lens (5) for accelerating/focusing ions emitted from the ion source; a movable first aperture (6) for limiting an ion beam passing through the focusing lens; a first deflector (35) for scanning or aligning the ion beam passing through the first aperture; a second deflector (7) for deflecting the ion beam passing through the first aperture; a second aperture (36) for limiting the ion beam passing through the first aperture; an objective lens (8) for focusing the ion beam passing through the first aperture on a sample; and means for measuring a signal amount which is roughly proportional to the ion beam currents passing through the second aperture.
申请公布号 JP2015057801(A) 申请公布日期 2015.03.26
申请号 JP20140263843 申请日期 2014.12.26
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SHICHI HIROYASU;MATSUBARA SHINICHI;ARAI NORIAKI;ISHITANI TORU;OSE YOICHI;KAWANAMI YOSHIMI
分类号 H01J37/28;H01J27/26;H01J37/09;H01J37/147;H01J37/16 主分类号 H01J37/28
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