| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern simulating method which reduces the calculation time. <P>SOLUTION: All shot reticle patterns corresponding to divisions of a liquid crystal panel divided every shot are OR-computed to form an expected pattern showing the layout state of all exposed regions of the liquid crystal panel. Using the expected pattern, the entire exposure pattern is simulated to result in no need of previously separately preparing an expected pattern. The expected pattern is formed using reticle data and exposing data, and hence the hierarchical structures of the data of the divided regions on the expected pattern become proximate to result in suited data to the pattern computation. This reduces the processing data quantity and the calculation time in the simulation of the entire exposure pattern, based on the expected pattern. <P>COPYRIGHT: (C)2007,JPO&INPIT |
