| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the utilization efficiency of either one of the calibration of a unit constituting an exposure device and measurement by the unit. <P>SOLUTION: The exposure device transfers a pattern formed on an original plate 2 through a projection optical system 5 to a substrate 8. The exposure device comprises a judgement part 90 for judging the validity of the calibration or the measurement, on the basis of the state amount of the unit when either one of the calibration of the unit constituting the exposure device and the measurement by the unit is executed and the state amount of the unit at present; and a control unit 70 for making either one of the calibration and the measurement be executed again on the basis of the judged result of the judgement part 90. <P>COPYRIGHT: (C)2007,JPO&INPIT |
