METHOD FOR PRODUCING THIN FILM TRANSISTOR AND THIN FILM TRANSISTOR

摘要

[Problem] To provide: a method for producing a thin film transistor with which variation and a deterioration in performance can be suppressed; and a thin film transistor. [Solution] This method for producing a thin film transistor 1 (1A) includes: a step in which a first conductive layer is formed on one main surface of a substrate 2 and a second conductive layer is formed on the other main surface of the substrate 2; a step in which a mask layer is collectively formed on the first conductive layer and second conductive layer; a step in which, by collectively bringing the first conductive layer and second conductive layer into contact with an etching liquid and removing a partial region of the first conductive layer and second conductive layer, a source electrode 6 and a drain electrode 7 are formed on the one main surface of the substrate 2 and a gate electrode 5 is formed on the other main surface of the substrate 2; and a step in which an organic semiconductor layer 3 is formed on the one main surface of the substrate 2 from which the first conductive layer has been removed.