| 摘要 |
A method is provided for manufacturing a conductive pattern forming member which, while suppressing the occurrence of residues in the dissolution and removal of unexposed portions, has excellent resistance to ion migration between a conductive pattern formed on a substrate and a photosensitive resin layer. This method for manufacturing a conductive pattern forming member involves: a coating step for obtaining a coated film C by coating a compound C, which contains conductive particles and a resin (c) having a double bond and a carboxyl group, onto the surface of a transparent electrode layer B, and a layer A comprising a resin (a) having a carboxyl group, formed on the substrate; a drying step for drying the coated film C to obtain a dry film C; an exposure step for exposing the dry film C to obtain an exposed film C; a developing step for developing the exposed film C to obtain a pattern C; and a curing step for curing the pattern C to obtain a conductive pattern C, wherein the ratio of the conductive particles that have a 0.3-2.0μm particle diameter is greater than or equal to 80%. |
