发明名称 MICRO MANIPULATION DEVICE FOR MICROSCOPIC MINUTE WORK
摘要 PROBLEM TO BE SOLVED: To provide a manipulation device capable of removing an insulation film efficiently, transferring a probe to a measurement spot and positioning it efficiently, and performing minute work excellent in operability and certainty when directly measuring the electric property of a deep layer of a multi-layered micro wiring such as a semiconductor integrated circuit, and analyzing a defective spot while observing a sample and a needle point of the micro probe under the visual field of a microscopic observation image. SOLUTION: The micro manipulation device for microscopic minute work comprises a local plasma mechanism and a structure in which a plasma capillary tube positioning stage that holds a plasma capillary tube which is an edge part of the local plasma mechanism, a sample stage, and one or more probes are placed on a prober base, and the prober base is removably mounted under the microscopic visual field. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008046324(A) 申请公布日期 2008.02.28
申请号 JP20060221399 申请日期 2006.08.15
申请人 SANYU SEISAKUSHO:KK 发明人 KATOGI KATSUYA;KAWAKAMI TATSUO;NIIHORI SHUNICHIRO;KATSUTA TEIJI
分类号 G02B21/32;B25J7/00;G01R31/26;H01J37/20;H01L21/66 主分类号 G02B21/32
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