| 发明名称 |
MANUFACTURE OF ELECTROLESS COBALT DEPOSITION COMPOSITIONS FOR MICROELECTRONICS APPLICATIONS |
| 摘要 |
A method of preparing an aqueous electroless deposition composition for electrolessly depositing Co or a Co alloy onto a substrate in manufacture of microelectronic devices by treating water or an aqueous electroless deposition composition with a deoxygenating treatment to reduce the oxygen concentration.
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| 申请公布号 |
US2008090414(A1) |
申请公布日期 |
2008.04.17 |
| 申请号 |
US20060549775 |
申请日期 |
2006.10.16 |
| 申请人 |
ENTHONE INC. |
发明人 |
CHEN QINGYUN;HURTUBISE RICHARD;PANECCASIO VINCENT;VALVERDE CHARLES;STRITCH DANIEL |
| 分类号 |
H01L21/44;C25D3/12 |
主分类号 |
H01L21/44 |
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