SUBSTRATE PROCESSING SYSTEM, INSPECTION APPARATUS AND INSPECTION METHOD

摘要

PURPOSE: A substrate processing system, an inspection apparatus and an inspection method inspecting a state of a surface of a corresponding target object through a photographing control unit are provided to correspond the substrate of different brightness by controlling characteristic information about the reflectivity of the light of substrate. CONSTITUTION: An inspection device comprises a memory unit(32), a photographing unit(21) and a photographing control unit. The memory unit emorizes the characteristic information about the reflexibility of the light on the substrate. The imaging device takes a picture of the substrate returned by a return unit. The imaging control unit controls exposure time on the substrate according to the characteristic information of the substrate of the memory unit.