GAS INJECTION APPARATUS AND THIN FILM DEPOSITION EQUIPMENT INCLUDING THE SAME

摘要

The present invention provides a gas injection device capable of enhancing absorption efficiency of a gas on a substrate. The gas injection device comprises: a base plate; a first gas separation region on the base plate; first and second source gas supply regions adjacent to both sides of the first gas separation region in a circumferential direction on the base plate and configured to supply a source gas; and a first reaction gas supply region not arranged between the first gas separation region and the first source gas supply region and between the first gas separation region and the second source gas supply region and configured to supply a reaction gas.