发明名称 |
Positive photoresist composition and pattern making method using the same |
摘要 |
<p>Apositive photoresist composition containing: (A) a resin which contains at least one of a repeating unit represented by the formula (IA) defiend herein and a repeating unit represented by the formula (IB) defined herein, and is decomposed by an action of an acid and shows an increase in a solubility in an alkali developer; and (B) as compounds capable of generating an acid upon irradiation with one of an actinic ray and a radiation, at least two compounds selected from the compounds (B1), (B2), (B3) and (B4) as defiend herein.</p> |
申请公布号 |
EP1508838(A2) |
申请公布日期 |
2005.02.23 |
申请号 |
EP20040019818 |
申请日期 |
2004.08.20 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KANNA, SHINICHI;MIZUTANI, KAZUYOSHI;SASAKI, TOMOYA |
分类号 |
C08F20/10;C08F32/00;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 |
主分类号 |
C08F20/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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