| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing composition suitable for use in an application of polishing an object to be polished made of silicon dioxide, and to provide a polishing method using such a polishing composition. <P>SOLUTION: The polishing composition contains silica abrasive grains of the average particle diameter of 20 to 100 nm; alkali selected from ammonia, ammonium salt, alkali metal salt, and alkali metal hydroxide; and silicone oil with≥8 HLB value. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
