| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion implanter capable of prolonging a period in that process failures due to spattering from a deposition of ionic species on the inner surfaces of through-holes of a member through which ion beam shapes are formed can be prevented, reducing the frequency of replacement of an aperture, and increasing the productivity. SOLUTION: A taper facing ionic beam is provided at least on one part of at least the inner surface of a through-hole 222 of an aperture member 220 through which a beam shape is formed. A spray deposition layer is formed thick on the inner surface of the through-hole 222 and its vicinity. COPYRIGHT: (C)2009,JPO&INPIT
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