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发明名称
Verfahren zur Reinigung von halbleitenden Substraten nach dem Läppen
摘要
申请公布号
DE69800721(T2)
申请公布日期
2001.11.22
申请号
DE19986000721T
申请日期
1998.02.11
申请人
SHIN-ETSU HANDOTAI CO., LTD.
发明人
MIYAZAKI, SEIICHI;OKADA, SUMIYOSHI
分类号
B08B3/08;B05D5/00;B24B55/06;B81C1/00;C23F1/40;C23G1/14;H01L21/304;(IPC1-7):H01L21/304
主分类号
B08B3/08
代理机构
代理人
主权项
地址
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