| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a photomask having a fine and high-definition transfer pattern.SOLUTION: A method for manufacturing a photomask is provided, which includes: a step of preparing a photomask blank having an underlay film, an overlay film, and a photoresist film formed on a transparent substrate; a step of forming a first resist pattern by subjecting the photoresist film to drawing and preliminary development; a preliminary etching step of preliminarily etching the overlay film by using the first resist pattern as a mask; an underlay film patterning step of etching the underlay film by using the first resist pattern or an overlay film pattern formed by the preliminary etching as a mask; an additional developing step of forming a second resist pattern by subjecting the first resist pattern to additional development; an overlay film patterning step of subjecting the overlay film to additional etching by using the second resist pattern as a mask; and a peeling step of peeling the second resist pattern. |
