| 摘要 |
PURPOSE: An apparatus and a method for cleaning a substrate are provided to heat the first cleaning material supplied from a cleaning material supply unit to generate the second cleaning material of a steam state and spray the second cleaning material on the substrate to clean, thereby cleaning the substrate through the first cleaning material with a relatively smaller amount. CONSTITUTION: A method for cleaning a substrate comprises the following steps. The first cleaning material of a liquid state with a predetermined amount is supplied to a heating space(S10). When the first cleaning material with the predetermined amount is supplied to the heating space, the first cleaning material is heated to generate the second cleaning material of a steam state(S20). The second cleaning material is sprayed on the substrate while adjusting spraying pressure of the second cleaning material to clean the substrate(S30).
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