发明名称 Silicon Wafer Pre-alignment Device and Method Therefor
摘要 A wafer pre-alignment device is disclosed, including a first unit configured to drive a wafer to rotate or move upward or downward, a second unit configured to drive the wafer to translate, and a position detector including a light source, a lens and an image sensor. A light beam from the light source passes through the wafer and the lens and thereby provides information indicating a position of the wafer to the image sensor. The first unit and the second unit are able to adjust the position of the wafer based on the information obtained by the image sensor. A method for pre-aligning a TSV wafer is also disclosed.
申请公布号 US2016329229(A1) 申请公布日期 2016.11.10
申请号 US201415109040 申请日期 2014.12.26
申请人 SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD. 发明人 SUN Weiwang;WANG Gang;HUANG Chunxia;HU Songli;JIANG Jie;LU Ruzhan;MOU Jiyuan
分类号 H01L21/68;H01L21/683;H01L21/66;H01L21/687 主分类号 H01L21/68
代理机构 代理人
主权项 1. A wafer pre-alignment device, comprising: a first unit configured to drive a wafer to rotate or move upward or downward, the first unit comprising a first chuck for retaining the wafer; a second unit configured to drive the wafer to translate relative to the first chuck; a position detector comprising a light source, an image sensor disposed above the first chuck, and a lens disposed under the first chuck, wherein a light beam from the light source passes through the wafer, the first chuck and the lens and thereby provides information indicating a position of the wafer relative to the first chuck on to the image sensor, wherein the first unit and the second unit are configured to adjust the position of the wafer relative to the first chuck based on the information obtained by the image sensor.
地址 Shanghai CN