SPUTTERING APPARATUS TO PREVENT THIN FILM LIKE ORGANIC LAYER FORMED ON SUBSTRATE FROM BEING DAMAGED

摘要

PURPOSE: A sputtering apparatus is provided to prevent a thin film like an organic layer formed on a substrate from being damaged by including a magnetic shielding unit and/or electrical blocking unit between a target part and the substrate and by preventing electrons and Ar+ ions from transferring toward the substrate. CONSTITUTION: A chamber(111) is filled with sputtering gas. A target part(120) makes the sputtering gas have a plasma state, installed in the chamber and including a target(121) and a magnetic field generating unit(130) for generating a magnetic filed such that the magnetic field generating unit is installed in a side of the target part. A substrate support part supports a substrate(113) on which the target particles discharged from the target are deposited, disposed in a position of the chamber confronting the target part. A blocking unit prevents the electrons and positive ions of the plasma formed in the chamber from migrating to the substrate to avoid a collision between the electrons/positive ions and the substrate, disposed between the target part and the substrate support part.