| 摘要 |
A gas scrubber and a method for operating the same are provided to prevent a CVD(Chemical Vapor Deposition) apparatus from being corroded, by stopping a wet scrubber from supplying water while NF3 gas is supplied for a CVD process so as to minimize the generation of HF. A gas scrubber includes a wet scrubber(31), wherein the wet scrubber treats waste gas, which is exhausted during a CVD process using NF3 gas, by spraying water to the waste gas. The work of spraying the water is stopped after the NF3 gas is supplied for the CVD process before the NF3 is completely passed through the wet scrubber. While the wet scrubber stops the spraying of the water, nitrogen gas is supplied to the wet scrubber through a nitrogen supplying pipe(54).
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