发明名称 CONTACT UNIT
摘要 The present invention provides a contact unit which enables reduction of an interval between contacts to be inserted into a through hole formed in a plate. According to the contact unit of the invention, a contact 20 of an IC socket 10 is formed so that a first flange portion 21 b is disposed in a gap S 1 between an upper plate 13 and an intermediate plate 14 x while an outside diameter d 2 of the first flange portion 21 b is set larger than a diameter D 2 of an upper through hole 11 a of the upper plate 13 and that a second flange portion 22 b is disposed in a gap S 2 between an intermediate plate 14 y and a lower plate 15 while an outside diameter d 4 of a second flange portion 22 b is set larger than a diameter D 4 of a lower through hole 15a of the lower plate 15.
申请公布号 US2008050944(A1) 申请公布日期 2008.02.28
申请号 US20070843731 申请日期 2007.08.23
申请人 ENPLAS CORPORATION 发明人 ODA TAKAHIRO
分类号 H01R12/00 主分类号 H01R12/00
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