发明名称 SUBSTRATE MANUFACTURING DEVICE AND SUBSTRATE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate manufacturing device capable of making the quantity of heat given to a substrate constant. SOLUTION: In a heat treatment furnace 120 of a substrate manufacturing device 100, a carrying controlling thermocouple 150 measuring temperature change generated in carrying of a substrate Kx is provided. A carrying controlling means 160 of the substrate manufacturing device 100 recognizes a carrying interval Qy according to the temperature change measured by the carrying controlling thermocouple 150, and controls the rotation speed of an adjusting carrying roller 111B, thereby individually controlling the carrying speed of the substrate Kx. Therefore, for example, by the substrate Kx and the like, even if the carrying speed of the substrate Kx differs from other substrates Kx, the carrying interval Qy of the substrates Kx is recognized by the temperature change, and the carrying speed of the substrates Kx is individually controlled according to the carrying interval Qy, thereby making the carrying interval Qy constant. Therefore, the quantity of heat given to the substrate Kx can be made constant. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009046280(A) 申请公布日期 2009.03.05
申请号 JP20070215787 申请日期 2007.08.22
申请人 PIONEER ELECTRONIC CORP 发明人 YOSHIDA SHINICHI;MATSUKAWA MAKOTO
分类号 B65G49/06;B05C9/14;B05C13/00;F26B15/00;G02F1/1333;G09F9/00;H01J9/24 主分类号 B65G49/06
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