发明名称 |
LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC METHOD |
摘要 |
In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area. |
申请公布号 |
EP2329322(B1) |
申请公布日期 |
2016.09.07 |
申请号 |
EP20090740535 |
申请日期 |
2009.09.21 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
DE JAGER, PIETER WILLEM HERMAN;BANINE, VADIM YEVGENYEVICH;BENSCHOP, JOZEF PETRUS HENRICUS;GUI, CHENG-QUN;ONVLEE, JOHANNES;VAN ZWET, ERWIN JOHN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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