发明名称 Plasma confinement rings including RF absorbing material for reducing polymer deposition
摘要 Plasma confinement rings are adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to substantially reduce polymer deposition on those surfaces. The plasma confinement rings include an RF lossy material effective to enhance heating at portions of the rings. A low-emissivity material can be provided on a portion of the plasma confinement ring assembly to enhance heating effects.
申请公布号 US2006283552(A1) 申请公布日期 2006.12.21
申请号 US20050155493 申请日期 2005.06.20
申请人 ROGERS JAMES H 发明人 ROGERS JAMES H.
分类号 H01L21/306;H01L21/302 主分类号 H01L21/306
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