发明名称 TRANSISTOR AND ELECTRONIC DEVICE
摘要 A semiconductor device with favorable electrical characteristics or a highly reliable semiconductor device is provided. The semiconductor device is a transistor including a first oxide film. The first oxide film contains indium, an element M, and zinc. The first oxide film includes a region in which the atomic ratio of indium to the element M and zinc satisfies indium : element M:zinc = xb:yb:zb For xb:yb:zb, (1 - α1):(1 +α1):m1 or (1 -α2):(1 +α2):m2 is satisfied, where α1 is greater than or equal to -0.43 and less than or equal to 0.18, α2 is greater than or equal to -0.78 and less than or equal to 0.42, and m1 and m2 are each greater than 0.7 and less than or equal to 1.
申请公布号 WO2016157016(A1) 申请公布日期 2016.10.06
申请号 WO2016IB51539 申请日期 2016.03.18
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI, Shunpei;SHIMOMURA, Akihisa
分类号 H01L29/786;C23C14/08;H01L21/28;H01L21/336;H01L21/363;H01L21/8234;H01L21/8238;H01L21/8242;H01L21/8244;H01L21/8247;H01L27/06;H01L27/08;H01L27/088;H01L27/092;H01L27/108;H01L27/11;H01L27/115;H01L27/146;H01L29/417;H01L29/423;H01L29/49;H01L29/788;H01L29/792 主分类号 H01L29/786
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