| 摘要 |
Provided is a substrate processing device that is provided with: a processing tank (12) that stores a processing liquid and that is for processing a plurality of substrates (24) that are arranged at prescribed intervals; a flow path (14a) through which the processing liquid flows in the thickness direction of the plurality of substrates (24); a plurality of openings (15) that are formed along the flow path; first and second discharge parts (14b1, 14b2) that have tip surfaces (161, 162) that close the tip of the flow path (14a); and a supply path (18) that has a liquid-supply port (20) and that supplies the processing liquid to base ends (14bs, 14be) of the first discharge part (14b1) and the second discharge part (14b2). The substrate processing device is characterized in that the distance from the liquid-supply port (20) to the tip surface (162) of the second discharge part (14b2) is substantially equal to the distance from the liquid-supply port (20) to the tip surface (161) of the first discharge part (14b1). The substrate processing device can perform processing that achieves greater uniformity among substrates. |
