发明名称 |
LDMOS FinFET device using a long channel region and method of manufacture |
摘要 |
A FinFET includes a semiconductor fin supporting a first transistor and a second transistor. A first transistor gate electrode extends over a first channel region of the fin and a second transistor gate electrode extends over a second channel region of the fin. Epitaxial growth material on a top of the fin forms a raised source region on a first side of the first transistor gate electrode, an intermediate region between a second side of the first transistor gate electrode and a first side of the second transistor gate electrode, and a raised drain region on a second side of the second transistor gate electrode. The first and second transistor gate electrodes are short circuit connected to each other, with the first transistor configured to have a first threshold voltage and the second transistor configured to have a second threshold voltage different from the first threshold voltage. |
申请公布号 |
US9082852(B1) |
申请公布日期 |
2015.07.14 |
申请号 |
US201414560472 |
申请日期 |
2014.12.04 |
申请人 |
STMicroelectronics, Inc.;GlobalFoundries Inc.;International Business Machines Corporation |
发明人 |
Liu Qing;Xie Ruilong;Cai Xiuyu;Yeh Chun-Chen |
分类号 |
H01L29/78 |
主分类号 |
H01L29/78 |
代理机构 |
Gardere Wynne Sewell LLP |
代理人 |
Gardere Wynne Sewell LLP |
主权项 |
1. An integrated FinFET transistor circuit, comprising:
a fin of semiconductor material supporting a first transistor and a second transistor; a first transistor gate electrode extending over a first channel region of said fin; a second transistor gate electrode extending over a second channel region of said fin; a raised source region of epitaxial growth material extending from a top of said fin on a first side of the first transistor gate electrode; a raised intermediate region of said epitaxial growth material extending from a top of said fin between a second side of the first transistor gate electrode and a first side of the second transistor gate electrode; a raised drain region of said epitaxial growth material extending from a top of said fin on a second side of the second transistor gate electrode; wherein the first and second transistor gate electrodes are short circuit connected to each other; and wherein said first transistor is configured to have a first threshold voltage and said second transistor is configured to have a second threshold voltage that is different than the first threshold voltage. |
地址 |
Coppell TX US |