发明名称 UV LIGHT IRRADIATING APPARATUS WITH LIQUID FILTER
摘要 A UV light irradiating apparatus for irradiating a semiconductor substrate with UV light includes: a reactor in which a substrate-supporting table is provided; a UV light irradiation unit connected to the reactor for irradiating a semiconductor substrate placed on the substrate-supporting table with UV light through a light transmission window; and a liquid layer forming channel disposed between the light transmission window and at least one UV lamp for forming a liquid layer through which the UV light is transmitted. The liquid layer is formed by a liquid flowing through the liquid layer forming channel.
申请公布号 US2008230721(A1) 申请公布日期 2008.09.25
申请号 US20070690614 申请日期 2007.03.23
申请人 ASM JAPAN K.K. 发明人 MATSUSHITA KIYOHIRO;KAGAMI KENICHI
分类号 G21K5/10 主分类号 G21K5/10
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