| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint device capable of alleviating a burden on a user.SOLUTION: An imprint device that forms a pattern of an imprint material on a substrate by making the imprint material on the substrate be contacted with a mold, comprises: storage means that stores information related to a position of a first region on the substrate on whose surface pattern unevenness remains; determination means that determines whether or not the first region and a second region are overlapped with each other by using the information related to the position of the first region and stored in the storage means and information related to a position of the second region depending on a recipe of the substrate; and avoidance means that performs processing for avoiding formation of the pattern depending on the recipe on the first region in a case where it is determined that the first region and the second region are overlapped with each other by the determination means.SELECTED DRAWING: Figure 1 |
