发明名称 |
QUALITY EVALUATION METHOD FOR SILICON WAFER, AND SILICON WAFER AND METHOD OF PRODUCING SILICON WAFER USING THE METHOD |
摘要 |
After determining the size of oxygen precipitates and the residual oxygen concentration in a silicon wafer after heat treatment performed in a device fabrication process; the critical shear stress τcri at which slip dislocations are formed in the silicon wafer in the device fabrication process is determined based on the obtained size of the oxygen precipitates and residual oxygen concentration; and the obtained critical shear stress τcri and the thermal stress τ applied to the silicon wafer in the heat treatment of the device fabrication process are compared, thereby determining that slip dislocations are formed in the silicon wafer in the device fabrication process when the thermal stress τ is equal to or more than the critical shear stress τcri, or determining that slip dislocations are not formed in the silicon wafer in the device fabrication process when the thermal stress τ is less than the critical shear stress τcri. |
申请公布号 |
US2016247694(A1) |
申请公布日期 |
2016.08.25 |
申请号 |
US201615052235 |
申请日期 |
2016.02.24 |
申请人 |
SUMCO CORPORATION |
发明人 |
FUJISE Jun;ONO Toshiaki |
分类号 |
H01L21/322;H01L29/16;C30B29/06;G01N3/24;C30B15/00;C30B13/00;H01L21/66;H01L29/32 |
主分类号 |
H01L21/322 |
代理机构 |
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代理人 |
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主权项 |
1. A quality evaluation method for a silicon wafer, comprising the steps of:
determining the size of oxygen precipitates and the residual oxygen concentration in a silicon wafer after heat treatment performed in a device fabrication process; subsequently determining the critical shear stress τcri at which slip dislocations are formed in the silicon wafer in the device fabrication process based on the obtained size of the oxygen precipitates and residual oxygen concentration; and comparing the obtained critical shear stress τcri and the thermal stress τ applied to the silicon wafer in the heat treatment of the device fabrication process, whereby determining that slip dislocations are formed in the silicon wafer in the device fabrication process when the thermal stress τ is equal to or more than the critical shear stress τcri, or determining that slip dislocations are not formed in the silicon wafer in the device fabrication process when the thermal stress τ is less than the critical shear stress τcri. |
地址 |
Tokyo JP |