发明名称 ALIGNING AND FOCUSING AN ELECTRON BEAM IN AN X-RAY SOURCE
摘要 A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.
申请公布号 US2016247656(A1) 申请公布日期 2016.08.25
申请号 US201615147394 申请日期 2016.05.05
申请人 Excillum AB 发明人 HEMBERG Oscar;TUOHIMAA Tomi;SUNDMAN Björn
分类号 H01J35/14;H01J35/08 主分类号 H01J35/14
代理机构 代理人
主权项
地址 Kista SE