发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PIXEL LAYER, PROTECTIVE FILM, SPACER, THIN-FILM TRANSISTOR, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY APPARATUS |
摘要 |
The invention provides a photosensitive resin composition that can be applied in a pixel layer, a protective film, a spacer, a thin-film transistor, a color filter, and a liquid crystal display apparatus and can provide good development properties and high-precision pattern linearity. The photosensitive resin composition includes: an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), an organic solvent (D), and a compound (E) represented by formula (1).; |
申请公布号 |
US2016313639(A1) |
申请公布日期 |
2016.10.27 |
申请号 |
US201615099615 |
申请日期 |
2016.04.15 |
申请人 |
Chi Mei Corporation |
发明人 |
Hsu Cheng-Chang;Hsieh Bar-Yuan |
分类号 |
G03F7/00;G02B1/14;G02F1/1339;G02F1/1368;G02F1/1335;G03F7/038;G02B5/22 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
1. A photosensitive resin composition, comprising:
an alkai-soluble resin (A); a compound (B) containing an ethylenically unsaturated group; a photoinitiator (C); an organic solvent (D); and a compound represented by formula (1);formula (1)
in formula (1), R′ each independently represent a hydrogen atom, a C1 to C20 substituted or unsubstituted hydrocarbon group or acyl group, R″ each independently represent a hydrogen atom, a C1 to C15 substituted or unsubstituted hydrocarbon group, acyl group, or nitro group, m represents an integer of 0, 1, or 2, X is a group having a structure represented by formula (2);formula (2)
in formula (2), R represents a hydrogen atom or a C1 to C4 alkyl group. |
地址 |
Tainan City TW |