发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PIXEL LAYER, PROTECTIVE FILM, SPACER, THIN-FILM TRANSISTOR, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY APPARATUS
摘要 The invention provides a photosensitive resin composition that can be applied in a pixel layer, a protective film, a spacer, a thin-film transistor, a color filter, and a liquid crystal display apparatus and can provide good development properties and high-precision pattern linearity. The photosensitive resin composition includes: an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), an organic solvent (D), and a compound (E) represented by formula (1).;
申请公布号 US2016313639(A1) 申请公布日期 2016.10.27
申请号 US201615099615 申请日期 2016.04.15
申请人 Chi Mei Corporation 发明人 Hsu Cheng-Chang;Hsieh Bar-Yuan
分类号 G03F7/00;G02B1/14;G02F1/1339;G02F1/1368;G02F1/1335;G03F7/038;G02B5/22 主分类号 G03F7/00
代理机构 代理人
主权项 1. A photosensitive resin composition, comprising: an alkai-soluble resin (A); a compound (B) containing an ethylenically unsaturated group; a photoinitiator (C); an organic solvent (D); and a compound represented by formula (1);formula (1) in formula (1), R′ each independently represent a hydrogen atom, a C1 to C20 substituted or unsubstituted hydrocarbon group or acyl group, R″ each independently represent a hydrogen atom, a C1 to C15 substituted or unsubstituted hydrocarbon group, acyl group, or nitro group, m represents an integer of 0, 1, or 2, X is a group having a structure represented by formula (2);formula (2) in formula (2), R represents a hydrogen atom or a C1 to C4 alkyl group.
地址 Tainan City TW