Layout Decomposition Methods and Systems

摘要

A layout decomposition method is provided which may include building, a graph including a plurality of nodes and edges from a layout design including a plurality of polygons, wherein the nodes correspond to the polygons of the layout design and the edges identify two nodes disposed close to each other at a distance shorter than a minimum distance among the plurality of nodes, comparing degrees of the plurality of nodes with a reference value, selecting a target node, the degree of which exceeds the reference value, identifying a first and second subgraph based on the target node, performing multi-patterning technology decomposition on the first and second subgraph to acquire a first and second result, and creating first mask layout data corresponding to one portion of the layout design and second mask layout data corresponding to the other portion of the layout design by combining the first and second result.

主权项

1. A layout decomposition method comprising:
building a graph including a plurality of nodes and a plurality of edges from a layout design including a plurality of polygons, wherein respective ones of the plurality of nodes correspond to respective ones of the plurality of polygons of the layout design and respective ones of the plurality of edges identify two nodes disposed close to each other at a distance less than a predetermined minimum distance among the plurality of nodes; comparing degrees of respective ones of the plurality of nodes with a predetermined reference value; selecting a target node, the degree of which exceeds the predetermined reference value, from among the plurality of nodes; identifying a first subgraph and a second subgraph based on the target node, from the graph; performing multi patterning technology (MPT) decomposition on each of the first subgraph and the second subgraph to acquire a first result and a second result; and creating first mask layout data corresponding to a first portion of the layout design and second mask layout data corresponding to a second portion of the layout design by combining the first result and the second result.