| 摘要 |
A mask, a film forming method, a light-emitting device and an electronic apparatus are provided to prevent disconnection and uniformize the thickness of the film by using a reinforcing beam. A mask includes a substrate, a mask main body(41), and a reinforcing beam(44). A side of a plurality of linear bodies is fixed on the substrate. A film material is provided from the other side of the plurality of linear bodies by an evaporation process. The plurality of linear bodies installed in parallel is formed on a surface of the substrate. The mask main body(41) has a plurality of aperture units corresponding to a pattern of the linear body. The reinforcing beam(44) is installed to intersect the aperture unit(42). The reinforcing beam(44) prevents deformation of the mask main body(41) due to a self-weight. The reinforcing beam(44) is installed to be close to the other plane in a thickness direction of the aperture unit(42).
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