发明名称 Reglering av tryck i kaviteter på substrat
摘要 The invention relates to a new method of providing different and controlled atmospheres inside cavities on one and the same chip of a MEMS device. With the new method one can refrain from providing separate getter materials, and thereby the manufacturing is simplified. The method comprises providing a first substrate (20) and a second substrate (28) and making at least one depression (22', 22'') in at least one of the substrates(20). A structural component (26) is provided in or on a surface of at least one of the substrates, said structure containing entrapped, absorbed or adsorbed ions, molecules or atoms of a gas. The substrates are bonded together such that a cavity forms and becomes hermetically sealed. The obtained structure is subjected to conditions so as to release the implanted, absorbed or adsorbed gas atoms, ions or molecules from the substrate to provide said controlled atmosphere inside the cavity.
申请公布号 SE1450135(A1) 申请公布日期 2015.08.08
申请号 SE20140050135 申请日期 2014.02.07
申请人 SILEX MICROSYSTEMS AB 发明人 HÅKAN WESTIN;PETER WICKERT
分类号 B81C1/00;B81B1/00 主分类号 B81C1/00
代理机构 代理人
主权项
地址