PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

Provided is a pattern forming method which comprises: a step for forming a film using an active light sensitive or radiation sensitive resin composition; a step for exposing the film to light; and a step for forming a negative pattern by developing the film after light exposure with use of a developer liquid that contains an organic solvent. The active light sensitive or radiation sensitive resin composition contains a resin (Ab) that comprises, as a repeating unit that is decomposed by the action of an acid and generates a polar group, at least a repeating unit represented by general formula (Ab1).