| 摘要 |
An array substrate and a manufacturing method therefor. The array substrate comprises multiple sub-pixel units formed on a base substrate (100). Each sub-pixel unit comprises a thin film transistor (101), a pixel electrode (102), and a common electrode (103). A source electrode (1012), a drain electrode (1011) and a semiconductor layer (1013) of the thin film transistor and the pixel electrode (102) are covered with a gate electrode insulation layer (104). The gate electrode (1014) and the common electrode (103) of each thin film transistor are formed on the corresponding gate electrode insulation layer (104), the gate electrode is a transparent electrode, and the gate electrode and the common electrode are located on a same layer. The technical problem of excessively complicated manufacturing process is resolved. |
