发明名称 SYSTEM AND METHOD FOR RETICLE PREPARATION
摘要 <p><P>PROBLEM TO BE SOLVED: To prepare required reticles in time by collecting the housing condition of the reticle in an aligner before preparation and taking the use limit of reticle into account. <P>SOLUTION: The reticle preparation system is provided with semiconductor board exposure systems 7a and 7b that are connected with a host computer 1 through a communication line 6 to efficiently prepare reticles, on the basis of a reticle housing information collected by the host computer 1 from the semiconductor board exposure systems 7a and 7b and use limit frequency set to the reticle, when a production lot is subject to the semiconductor board aligners 7a and 7b; an output terminal 8 connected with the host computer 1 through the communication line 6; and reticle housing shelves 10a and 10b connected with the host computer 1 through the communication line 9. Before the reticle is put into the semiconductor board aligners 7a and 7b, an empty shelf is ensured, and one not exceeding the use limit frequency is selected, thereby realizing efficient preparation of the reticle. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005209780(A) 申请公布日期 2005.08.04
申请号 JP20040013001 申请日期 2004.01.21
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ITO DAISUKE;MURAI KOICHI;SHIMIZU YUZO
分类号 B65G1/137;G03F1/66;H01L21/027;(IPC1-7):H01L21/027;G03F1/14 主分类号 B65G1/137
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