发明名称 PATTERN FORMING METHOD
摘要 <p>By using an intaglio plate for holding a pattern formed by a developing agent, a transfer device for transferring patterns (27, 28, 29) developed on the intaglio plate to a transfer object medium (31), and a baking chamber (40) for eliminating an electrode layer (32) after transfer or heightening resistance thereof, the patterns (27, 28, 29) developed on the intaglio plate are transferred onto the electrode layer (32) disposed at the opposite side (31a) of the transfer object medium (31), and then heated in the baking chamber (40), whereby the electrode layer (32) is eliminated or heightened in resistance.</p>
申请公布号 EP2019387(A1) 申请公布日期 2009.01.28
申请号 EP20070742957 申请日期 2007.05.08
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SAITO, MITSUNAGA;SHINJIYO, YASUSHI;TAJIMA, YOSHIHIRO;ISHII, KOICHI;HOSOYA, MASAHIRO;TAKAHASHI, KEN
分类号 H05K3/12;G09F9/00;G02B5/20;H01J9/227;H01L21/3205;H05K3/20 主分类号 H05K3/12
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