| 摘要 |
A vertical diffusion furnace with a thermocouple for manufacturing a semiconductor is provided to prevent a profile thermocouple from being damaged by installing the profile thermocouple in a fixed type. A profile thermocouple(115) is inserted into an inner tube(130). The profile thermocouple is installed in a side of a wafer boat(50) loading a wafer(10). The profile thermocouple is inserted form an upper part of an outer tube(120) to a lower part of the inner tube. The profile thermocouple monitors the temperature change of the wafer continuously in a progress of the process by using a fixed type. A contact part(111) is formed in a position corresponding to the height of a spike thermocouple(70) separated in the upper and lower parts of a heater(40) with a regular interval. The thermocouple is connected to a plug and a temperature controller(175). The temperature controller controls the heating temperature of the heater based on the compensation value based on the measured temperature.
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