PROCESSING LIQUID SUPPLY DEVICE, PROCESSING LIQUID SUPPLY METHOD, AND STORAGE MEDIUM

摘要

An operation amount for operating a flow rate control mechanism of a processing liquid can be appropriately adjusted based on a physical property of the processing liquid or a characteristic of a processing liquid supply mechanism while supplying the processing liquid. In a processing liquid supply device that supplies a processing liquid to a substrate W, a processing liquid supply mechanism discharges the processing liquid toward the substrate W via a flow rate control mechanism 402 which controls the processing liquid based on an operation amount. A flow rate detection unit 403 detects a flow rate of the processing liquid supplied to the substrate W. A system identification unit 182 determines a system parameter according to a system model of the processing liquid supply mechanism. A flow rate controller 182 determines a new operation amount of the flow rate control mechanism by using the system parameter.

主权项

1. A processing liquid supply device of supplying a processing liquid to a target substrate held on a substrate holder, the processing liquid supply device comprising:
a processing liquid supply mechanism including a flow rate control mechanism configured to be controlled based on an operation amount to adjust a flow rate of the processing liquid supplied from a processing liquid source, which stores the processing liquid therein, and a supply nozzle configured to discharge the processing liquid whose flow rate is adjusted by the flow rate control mechanism toward the substrate held on the substrate holder; a flow rate detection unit configured to detect the flow rate of the processing liquid supplied to the supply nozzle; a system identification unit configured to determine a system parameter based on a sum of product values obtained by multiplying the system parameter to each of a time-series sample value of the operation amount and a time-series sample value of the flow rate detected by the flow rate detection unit, in order to identify a system model for acquiring an estimated flow rate of the processing liquid discharged from the supply nozzle; and a flow rate controller configured to determine a new operation amount by using the system parameter determined by the system identification unit and output the determined operation amount to the flow rate control mechanism.