发明名称 Semiconductor light-emitting device
摘要 In a semiconductor laser having an active layer of double-quantum-well structure that includes two InGaN well layers each of which has a thickness of 5 nm, a threshold current deteriorates to a relatively small degree while differential efficiency is improved considerably in a region having a light confinement coefficient Gamma of 3.0% or less. On the other hand, with the light confinement coefficient Gamma becoming less than 1.5%, the threshold current increases considerably while the amount of improvement in differential efficiency becomes small. It is therefore preferable that the lowest limit to the light confinement coefficient Gamma be about 1.5%. The differential efficiency of 1.6 W/A or more is obtained with the light confinement coefficient Gamma being 3.0% or less, and the differential efficiency of 1.7 W/A or more is obtained with the light confinement coefficient Gamma being 2.6% or less.
申请公布号 US2006193359(A1) 申请公布日期 2006.08.31
申请号 US20060326503 申请日期 2006.01.06
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 KURAMOTO KYOSUKE
分类号 H01S5/20;B82Y20/00;H01S5/00;H01S5/323;H01S5/343 主分类号 H01S5/20
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