发明名称 Semiconductor Device and Fabricating Method Thereof
摘要 A semiconductor device for a system in a package (SiP) type device can include a semiconductor substrate; a pre-metal-dielectric (PMD) layer on the semiconductor substrate; at least one metal layer on the PMD layer; a first through-electrode extending through the semiconductor substrate and the PMD layer; and a second through-electrode connected to the first through-electrode through the metal layer.
申请公布号 US2008048282(A1) 申请公布日期 2008.02.28
申请号 US20070831560 申请日期 2007.07.31
申请人 HAN JAE WON 发明人 HAN JAE WON
分类号 H01L31/0232;H01L21/44;H01L23/48;H01L31/06 主分类号 H01L31/0232
代理机构 代理人
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